Parametric yields at sub-100nm process technologies suffer due to process variability. A complete solution and proven-methodology allows manufacturers and designers to collaboratively address emerging yield loss mechanisms and is mission critical for driving yields higher.

Stratosphere Solutions Inc. provides innovative parametric yield improvement solution including a silicon-proven IP platform and modeling applications empowering customers to reduce impact of variability on performance and parametric yield. The company’s silicon-proven intellectual property (IP) and variability modeling platforms empowers manufacturers to accurately characterize process variations for sub-100 nanometer processes and accurately capture them to bring the knowledge in the design flow. Stratopshere Solutions' customer base includes leading worldwide semiconductor companies building products utilizing processes from 130nm down to 45nm.

Stratosphere Solutions believes that yield must be managed through a holistic and collaborative approach that spans design and manufacturing.

Keithley Partners with Stratosphere Solutions to Enable Advanced Process Characterization at Sub-65nm click here  

Stone Pillar Technologies Joins Stratosphere Solutions' ICTrust Partner Program click here  

Stratosphere and Cadence Collaborate to Drive 45 Nanometer Design Yield and Performance Higher click here