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Renesas Technology
Adopts Stratosphere Solutions' StratoPro-STX Characterization
Platform for 45nm
True collaboration addresses variability and parametric
yield challenges in 45nm
Sunnyvale, CA - September 02, 2008 - Stratosphere
Solutions, Inc., a leading provider of semiconductor IP and
analysis tools that reduce the impact of variability on performance
and parametric yield, today announced that Renesas Technology
Corp., one of the world's leading semiconductor system solutions
providers for mobile, automotive, and PC/AV (Audio Visual)
markets, has selected StratoPro-STX™ variability characterization
platform for their 45 nanometer advanced SoC technology development
and production usage.
Random and systematic process variability
is a significant cause of parametric yield loss and higher
design margins at 65nm and 45nm. Deterministic physical models
and basic process characterization methods of using simple
devices or a few ring oscillators are not sufficient to improve
parametric yield. Using StratoPro-STX, engineers incorporate
complex devices within their characterization infrastructure,
extract within-die statistics such as mean and 3-sigma and
pin-point the exact location of any failing device while minimally
using scarcely available tester resources. StratoPro-STX results
empower engineers to rigorously characterize variability during
technology development, ramp parametric yield, and model local,
global, and random variations.
"At 45nm nodes and below, a test vehicle
that provides high resolution measurements consuming lowest
test time within a very small area per reticle is a must-have
for characterizing variability and developing accurate statistical
models," said Yasuo Yamaguchi, Chief Engineer, SOC Device
Technology Dept., Production Technology Development Div. at
Renesas Technology Corp. "We looked at various solutions
and decided that Stratosphere Solutions' StratoPro-STX™
silicon IP platform meets our requirements and fits well within
our existing tools infrastructure and methodology. StratoPro
allows our engineers to be in full control of proprietary
process data, retain technical know-how, and continuously
drive parametric yields higher."
"We are excited that Renesas has selected
our StratoPro-STX™ product for 45nm parametric variability
characterization" said Prashant Maniar, Chief Strategy
Officer, Stratosphere Solutions, Inc. "Renesas is emblematic
of our typical customer, where our product empowers internal
engineering teams to be more productive, and reduce cost of
ramping up parametric yield in the subsequent development
cycles. Renesas has been an excellent early adopter partner
and we are delighted to add Renesas to our growing IDM and
fab-lite customer list."
About Stratosphere Solutions
Stratosphere Solutions, Inc. is the leading provider of an
innovative parametric yield & performance improvement
solution including a silicon-proven IP platform and modeling
applications empowering customers to reduce impact of variability
on performance and parametric yield. Its customer base includes
leading worldwide semiconductor companies building products
utilizing processes from 130nm to 45nm. For additional information,
visit www.stratosol.com.
Products and company names listed are trademarks or trade
names of their respective companies.
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